Dr. Yung Huh
The Research Facility
-
The Thin Film Lab -
CEH 340, Physics Department
-
presentation
-
Deposition System
-
Magnetron Sputtering Deposition System
-
Sample Load-Lock to load samples
without breaking vacuum inside the chamber
-
Plasma
-
Carrier Gas Inlets; Ar and Hydrogen gas lines
-
Top-view of the Chamber; (1) Sample Load-Lock, (2) Four mask-changer,
(3) Glow-Discharge, and (4) Magnetron Cold-Cathode Gauge
-
Bottom-view of the chamber; (1)
Three Sputtering Targets, and (2) Shutter
-
Inside bottom-view of Chamber; (1) Three sputtering targets, (2) Thickness
monitor crystal, and (3) Mass-spectrometer sensor
-
Inside Top-view;
Glow-Discharge and Alignment pole
-
Inside the chamber; Attached to the top is a
Substrate holder with Four Fabrication Masks
-
Turbo-molecular
Pump and Controller
-
Roughing Pump
-
Oil-less Pump for sample load-lock
-
Mass
Spectrometer Sensor and Readout Screen
-
Cold-Cathode Pressure Gauge Sensor
and Controller
-
MKS 627B (Baratron Pressure Gauge)
-
Thermo-couple Pressure gauges and readouts
-
water-cooling
system for (1) Turbo-molecular pump, (2) Thickness monitoring crystal, and (3)
Sputtering targets
-
MKS 247 (Flow Controller) and MKS 250 (Pressure Controller)
-
Mass Flow Controller
-
Thickness Monitor Crystal and Controller
-

RF-Sputtering
Power Supply
-
MDX-1.5K (DC-sputtering Power Supply)
-
Thermal
process
-
Box Furnace
-
Quartz Tube Furnace
-
Device
Characterization