Dr. Yung Huh
The Research Facility
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The Thin Film Lab -
CEH 340, Physics Department
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presentation
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Deposition System
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Magnetron Sputtering Deposition System
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Sample Load-Lock to load samples
without breaking vacuum inside the chamber
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Plasma
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Carrier Gas Inlets; Ar and Hydrogen gas lines
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Top-view of the Chamber; (1) Sample Load-Lock, (2) Four mask-changer,
(3) Glow-Discharge, and (4) Magnetron Cold-Cathode Gauge
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Bottom-view of the chamber; (1)
Three Sputtering Targets, and (2) Shutter
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Inside bottom-view of Chamber; (1) Three sputtering targets, (2) Thickness
monitor crystal, and (3) Mass-spectrometer sensor
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Inside Top-view;
Glow-Discharge and Alignment pole
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Inside the chamber; Attached to the top is a
Substrate holder with Four Fabrication Masks
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Turbo-molecular
Pump and Controller
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Roughing Pump
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Oil-less Pump for sample load-lock
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Mass
Spectrometer Sensor and Readout Screen
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Cold-Cathode Pressure Gauge Sensor
and Controller
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MKS 627B (Baratron Pressure Gauge)
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Thermo-couple Pressure gauges and readouts
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water-cooling
system for (1) Turbo-molecular pump, (2) Thickness monitoring crystal, and (3)
Sputtering targets
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MKS 247 (Flow Controller) and MKS 250 (Pressure Controller)
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Mass Flow Controller
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Thickness Monitor Crystal and Controller
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RF-Sputtering
Power Supply
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MDX-1.5K (DC-sputtering Power Supply)
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Thermal
process
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Box Furnace
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Quartz Tube Furnace
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Device
Characterization
